Construction of the (Y,Yb)MnO3/HfO2 Stacking Layers through the Chemical Solution Process

By Suzuki Kazuyuki   Nishizawa Kaori   Miki Takeshi   Kato Kazumi  

Ferroelectrics, Vol. 357, Iss. 1, 2007-01 ,pp. : 196-200

Taylor & Francis Ltd

Access to resources Recommend Favorite

Characterization of (Y,Yb)MnO 3 /Y 2 O 3 /Si Prepared from Alkoxide Solutions

By Suzuki Kazuyuki   Tanaka Kiyotaka   Fu Desheng   Nishizawa Kaori   Miki Takeshi   Kato Kazumi  

Ferroelectrics, Vol. 329, Iss. 1, 2005-01 ,pp. : 107-111

Taylor & Francis Ltd

Access to resources Recommend Favorite

Molecular dynamics simulation of amorphous HfO₂ for resistive RAM applications

By Broglia G   Ori G   Larcher L   Montorsi M  

Modelling and Simulation in Materials Science and Engineering, Vol. 22, Iss. 6, 2014-09 ,pp. : 65006-65019

IOP Publishing

Access to resources Recommend Favorite

Comparative Studies of HfO₂, Y₂O₃, and CeO₂ Insulators in Metal-Nd₂Ti₂O₇ Ferroelectric-Insulator-Semiconductor Structures

By Kim Woo-Sic   Lee Hong-Sub   Choi Hye-Jung   Chung Sung-Woong   Park Hyung-Ho  

Ferroelectrics, Vol. 423, Iss. 1, 2011-01 ,pp. : 45-53

Taylor & Francis Ltd

Access to resources Recommend Favorite

Preparation and characterization of HfO$_{2}$ thin films byphoto-assisted MOCVD

By  

Le Journal de Physique IV, Vol. 132, Iss. issue, 2006-03 ,pp. : 279-283

Edp Sciences

Access to resources Recommend Favorite