Preparation and characterization of HfO$_{2}$ thin films byphoto-assisted MOCVD

Publisher： Edp Sciences

E-ISSN： 1764-7177|132|issue|279-283

ISSN： 1155-4339

Source： Le Journal de Physique IV, Vol.132, Iss.issue, 2006-03, pp. : 279-283

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