Structural properties of relaxed Ge buffer layers on Si(0 0 1): effect of layer thickness and low temperature Si initial buffer

Author: Myrberg T.   Jacob A. P.   Nur O.   Friesel M.   Willander M.   Patel C. J.   Campidelli Y.   Hernandez C.   Kermarrec O.   Bensahel D.  

Publisher: Springer Publishing Company

ISSN: 0957-4522

Source: Journal of Materials Science: Materials in Electronics, Vol.15, Iss.7, 2004-07, pp. : 411-417

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content