Bias voltage dependence properties of cadmium oxide films deposited by d.c. reactive magnetron sputtering

By Mohan Babu P.   Venkata Rao G.   Sreedhara Reddy P.   Uthanna S.  

Journal of Materials Science: Materials in Electronics, Vol. 15, Iss. 6, 2004-06 ,pp. : 389-394

Springer Publishing Company

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Physicochemical and structural characteristics of TiC and VC thin films deposited by DC reactive magnetron sputtering

By Aguzzoli C.   Figueroa C.   Soares G.   Baumvol I.  

Journal of Materials Science, Vol. 45, Iss. 18, 2010-09 ,pp. : 4994-5001

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Bias induced structural changes in tungsten nitride films deposited by unbalanced magnetron sputtering

By Guruvenket S.   Mohan Rao G.  

Materials Science and Engineering: B, Vol. 106, Iss. 2, 2004-01 ,pp. : 172-176

Elsevier

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The influence of substrate temperature on the properties of aluminum-doped zinc oxide thin films deposited by DC magnetron sputtering

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Journal of Materials Science: Materials in Electronics, Vol. 17, Iss. 12, 2006-12 ,pp. : 973-977

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Microhardness of (Ti,Al)N films deposited by reactive R.F. magnetron sputtering

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Journal of Materials Science Letters, Vol. 16, Iss. 1, 1997-01 ,pp. : 59-61

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