High boron incorporation in selective epitaxial growth of SiGe layers

Author: Ghandi R.   Kolahdouz M.   Hållstedt J.   Lu Jun   Wise R.   Wejtmans H.   Östling M.   Radamson H.  

Publisher: Springer Publishing Company

ISSN: 0957-4522

Source: Journal of Materials Science: Materials in Electronics, Vol.18, Iss.7, 2007-07, pp. : 747-751

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Abstract