The Influence of Resistance of the Epitaxial-Film Volume on the Capacity-Voltage Characteristics of the HgCdTe/AOF and HgCdTe/SiO2/Si3N4 MIS Structures

Author: Voitsekhovskii A.   Nesmelov S.   Dzyadukh S.  

Publisher: Springer Publishing Company

ISSN: 1064-8887

Source: Russian Physics Journal, Vol.48, Iss.6, 2005-06, pp. : 584-591

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