Mechanisms of Hf dopant incorporation during the early stage of chemical vapor deposition aluminide coating growth under continuous doping conditions

Author: Kim G.   He L.   Meyer J.   Lee W.   Quintero A.   Haynes J.  

Publisher: Springer Publishing Company

ISSN: 1543-1940

Source: Metallurgical and Materials Transactions A, Vol.35, Iss.11, 2004-11, pp. : 3581-3593

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