Applications of ions produced by low intensity repetitive laser pulses for implantation into semiconductor materials

Author: Wołowski J.   Badziak J.   Czarnecka A.   Parys P.   Pisarek M.   Rosinski M.   Turan R.   Yerci S.  

Publisher: Taylor & Francis Ltd

ISSN: 1042-0150

Source: Radiation Effects and Defects in Solids, Vol.163, Iss.4-6, 2008-04, pp. : 589-595

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