Investigation of the interface trap density and series resistance of a high-k HfO2-based MOS capacitor: before and after 50 MeV Li3+ ion irradiation

Author: Singh Vikram   Shashank N.   Kumar Dinesh   Nahar Rajender  

Publisher: Taylor & Francis Ltd

ISSN: 1042-0150

Source: Radiation Effects and Defects in Solids, Vol.166, Iss.2, 2011-02, pp. : 80-88

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