Weak Ferromagnetism of HfO2 Film on Compressively Strained Si83Ge17/Si Substrate

Author： Tu Y. T.   Zhou G. D.   Dai J. Y.   Li J.   Chen P.   Qiu X. Y.  

Publisher： Taylor & Francis Ltd

ISSN： 1058-4587

Source： Integrated Ferroelectrics, Vol.134, Iss.1, 2012-01, pp. : 10-12

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