Pb(Zr,Ti)O 3 Thin Film Deposited Using AlN Buffer Layer and Its Ferroelectric Properties

Author: LIN YUNG-CHEN   CHOU CHENG-HSIEN   TAI NYAN-HWA   HUANG JIN-HUA   LIN I-NAN  

Publisher: Taylor & Francis Ltd

ISSN: 1058-4587

Source: Integrated Ferroelectrics, Vol.64, Iss.1, 2004-01, pp. : 237-246

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Abstract