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Integrated Ferroelectrics, Vol. 45, Iss. 1, 2002-01 ,pp. : 183-188

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Preparation and Properties of V-Doped (Bi,Nd)4Ti3O12 Ferroelectric Thin Films by Chemical Solution Deposition Method

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Structural and Multiferroic Properties of Bi_3.4La_0.6Ti₃O₁₂/CoFe₂O₄ Composite Thin Films

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Integrated Ferroelectrics, Vol. 157, Iss. 1, 2014-10 ,pp. : 63-70

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ELECTRICAL PROPERTIES OF LAYER STRUCTURED BI 4 Ti 3 O 12 FERROELECTRICS WITH W 6+ DOPING

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Etch Characteristics of Ferroelectric (Bi4−xLax)Ti3O12 Thin Films in an Inductively Coupled Plasma

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