Non-linear dielectric constant increase with Ti composition in high-k ALD-HfTiOx films after O2 crystallization annealing

Publisher： IOP Publishing

ISSN： 1757-899X

Source： IOP Conference Series: Materials Science and Engineering, Vol.8, Iss.1, 2010-02, pp. : 109-112

Access to resources Favorite

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Influence of annealing temperature on structural, morphological and optical properties of nanostructured TiO2 thin films

By Sönmezoğlu S   Çankaya G   Serin N  

Materials Technology: Advanced Performance Materials, Vol. 27, Iss. 3, 2012-07 ,pp. : 251-256

Maney Publishing

Access to resources Recommend Favorite

Annealing time dependence of the physical, electrical and pH response characteristics of spin coated TiO2 thin films

By  

IOP Conference Series: Materials Science and Engineering, Vol. 99, Iss. 1, 2015-11 ,pp. : 159-165

IOP Publishing

Access to resources Recommend Favorite

Composition, Structure, and Catalytic Activity of SiO2+TiO2/Ti and MnOx+SiO2+TiO2/Ti Composites Formed by Combination of the Methods of Plasma Electrolytic Oxidation, Impregnation and Annealing

By  

Solid State Phenomena, Vol. 2015, Iss. 245, 2016-03 ,pp. : 238-242

Trans Tech Publications

Access to resources Recommend Favorite

Modelling and characterisation of high-k dielectric Thin-films using microwave techniques

By  

IOP Conference Series: Materials Science and Engineering, Vol. 8, Iss. 1, 2010-02 ,pp. : 94-97

IOP Publishing

Access to resources Recommend Favorite

High-permittivity metal-insulator-metal capacitors with TiO2 rutile dielectric and RuO2 bottom electrode

By  

IOP Conference Series: Materials Science and Engineering, Vol. 8, Iss. 1, 2010-02 ,pp. : 113-116

IOP Publishing

Access to resources Recommend Favorite