Publisher: IOP Publishing
ISSN: 1742-6596
Source: Journal of Physics: Conference Series , Vol.480, Iss.1, 2014-04, pp. : 97-101
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
RPECVD thin silicon carbonitride films using hexamethyldisilazane
Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. :
HYDROGEN PROFILING IN GAS PHASE DOPED AND ION IMPLANTED AMORPHOUS SILICON FILMS
Le Journal de Physique Colloques, Vol. 42, Iss. C4, 1981-10 ,pp. :
Helium ion bombardment induced amorphization of silicon crystals
Technical Physics Letters, Vol. 28, Iss. 7, 2002-07 ,pp. :