The effect of F₂ attachment by low-energy electrons on the electron behaviour in an Ar/CF₄ inductively coupled plasma

By Zhao Shu-Xia   Gao Fei   Wang You-Nian   Bogaerts Annemie  

Plasma Sources Science and Technology, Vol. 21, Iss. 2, 2012-04 ,pp. : 25008-25020

IOP Publishing

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Transport coefficients for electron scattering in CF₄/Ar/O₂ mixtures with a significant presence of F_x or CF_x radicals

By Nikitović Ž.   Stojanović V.   Petrović Z. Lj.   Cvelbar U.   Mozetič M.  

EPL (EUROPHYSICS LETTERS), Vol. 91, Iss. 5, 2010-09 ,pp. : 55001-55001

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Raman study of CF 4 in liquid Ar

By Nectoux P.   Drifford M.   Belloni L.   Vinit A.  

Molecular Physics, Vol. 49, Iss. 6, 1983-08 ,pp. : 1375-1384

Taylor & Francis Ltd

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An ab initio study of vibrational corrections to the electrical properties of the fluoromethanes: CH₃F, CH₂F₃, CHF₃ and CF₄

By Russell Anthony J.   Spackman Mark A.  

Molecular Physics, Vol. 98, Iss. 10, 2000-05 ,pp. : 633-642

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Intermolecular potentials for Ar+CF 4 and Ar+SF 6 from differential cross-sections

By Porter Andrew   Grosser Arthur  

Molecular Physics, Vol. 38, Iss. 2, 1979-08 ,pp. : 611-616

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