Publisher： IOP Publishing
ISSN： 1742-6596
Source： Journal of Physics: Conference Series , Vol.167, Iss.1, 2009-05, pp. : 94-99
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Access to resources
Recommend
Process characterization for LPCVD TEOS-ozone based SiO
Le Journal de Physique IV, Vol. 03, Iss. C3, 1993-08 ,pp. :
Low-temperature deposition of ultrathin SiO2 films on Si substrates
Journal of Physics: Conference Series , Vol. 514, Iss. 1, 2014-05 ,pp. :
Access to resources
PROCESS CHARACTERISATION FOR LPCVD DEPOSITION OF SiO
Le Journal de Physique Colloques, Vol. 50, Iss. C5, 1989-05 ,pp. :