Study of SiO2-films deposited by adding N2O or O2 to TEOS in photo-chemical vapor deposition at room temperature

Publisher: Edp Sciences

E-ISSN: 1764-7177|11|PR3|Pr3-1131-Pr3-1137

ISSN: 1155-4339

Source: Le Journal de Physique IV, Vol.11, Iss.PR3, 2001-08, pp. : Pr3-1131-Pr3-1137

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

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