Low temperature deposition of low stress silicon nitride by reactive magnetron sputtering
Publisher: IOP Publishing
ISSN: 1742-6596
Source: Journal of Physics: Conference Series , Vol.370, Iss.1, 2012-06, pp. : 130-134
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
LOW-TEMPERATURE CHEMICAL-VAPOR-DEPOSITION OF SILICON NITRIDE
Le Journal de Physique IV, Vol. 02, Iss. C2, 1991-09 ,pp. :