Highly Photocatalytically Active Iron(III) Titanium Oxide Thin films via Aerosol‐Assisted CVD

Publisher: John Wiley & Sons Inc

E-ISSN: 1521-3862|21|1-2-3|21-25

ISSN: 0948-1907

Source: CHEMICAL VAPOR DEPOSITION (ELECTRONIC), Vol.21, Iss.1-2-3, 2015-03, pp. : 21-25

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Abstract