CHEMICAL VAPOR DEPOSITION (ELECTRONIC),volume 21,issue 1-2-3  (03-2015)

Period of time： 2015年1-2-3期

Publisher： John Wiley & Sons Inc

Founded in： 1995

Total resources： 6

ISSN： 0948-1907

Subject： O Mathematical Sciences and Chemical

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CHEMICAL VAPOR DEPOSITION (ELECTRONIC),volume 21,issue 1-2-3

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Cover image from I. Parkin and co‐workers (Chem. Vap. Deposition2015, 21, 21)

CHEMICAL VAPOR DEPOSITION (ELECTRONIC),volume 21,issue 1-2-3 , Vol. 21, Iss. 1-2-3, 2015-03 , pp. n/a-n/a

John Wiley & Sons Inc

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Chem. Vap. Deposition (1–2–3/2015)

CHEMICAL VAPOR DEPOSITION (ELECTRONIC),volume 21,issue 1-2-3 , Vol. 21, Iss. 1-2-3, 2015-03 , pp. 1-3

John Wiley & Sons Inc

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CVD on Optical Fibers: Tilted Fiber Bragg Gratings as Real‐time Sensing Platforms

CHEMICAL VAPOR DEPOSITION (ELECTRONIC),volume 21,issue 1-2-3 , Vol. 21, Iss. 1-2-3, 2015-03 , pp. 4-20

John Wiley & Sons Inc

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Highly Photocatalytically Active Iron(III) Titanium Oxide Thin films via Aerosol‐Assisted CVD

CHEMICAL VAPOR DEPOSITION (ELECTRONIC),volume 21,issue 1-2-3 , Vol. 21, Iss. 1-2-3, 2015-03 , pp. 21-25

John Wiley & Sons Inc

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Growth and Properties of Amorphous Erbium‐doped Aluminum‐yttrium Oxide Films Deposited by Aerosol‐UV‐Assisted MOCVD

CHEMICAL VAPOR DEPOSITION (ELECTRONIC),volume 21,issue 1-2-3 , Vol. 21, Iss. 1-2-3, 2015-03 , pp. 26-32

John Wiley & Sons Inc

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Barrier Strain and Carbon Incorporation‐Engineered Performance Improvements for AlGaN/GaN High Electron Mobility Transistors**

CHEMICAL VAPOR DEPOSITION (ELECTRONIC),volume 21,issue 1-2-3 , Vol. 21, Iss. 1-2-3, 2015-03 , pp. 33-40

John Wiley & Sons Inc

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Aerosol‐Assisted CVD of Bismuth Vanadate Thin Films and Their Photoelectrochemical Properties

CHEMICAL VAPOR DEPOSITION (ELECTRONIC),volume 21,issue 1-2-3 , Vol. 21, Iss. 1-2-3, 2015-03 , pp. 41-45

John Wiley & Sons Inc

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Deposition of Iridium Thin Films on Three‐Dimensional Structures With PE‐MOCVD

CHEMICAL VAPOR DEPOSITION (ELECTRONIC),volume 21,issue 1-2-3 , Vol. 21, Iss. 1-2-3, 2015-03 , pp. 46-53

John Wiley & Sons Inc

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Doped Polycrystalline Silicon Thin Films Deposited on Glass from Trichlorosilane**

CHEMICAL VAPOR DEPOSITION (ELECTRONIC),volume 21,issue 1-2-3 , Vol. 21, Iss. 1-2-3, 2015-03 , pp. 54-62

John Wiley & Sons Inc

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Titanium Dioxide Thin Films Deposited by Electric Field‐Assisted CVD: Effect on Antimicrobial and Photocatalytic Properties**

CHEMICAL VAPOR DEPOSITION (ELECTRONIC),volume 21,issue 1-2-3 , Vol. 21, Iss. 1-2-3, 2015-03 , pp. 63-70

John Wiley & Sons Inc

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