Mechanism of the development of a weakly alkaline barrier slurry without BTA and oxidizer

Author: Xiaodong Luan   Yuling Liu   Xinhuan Niu   Juan Wang  

Publisher: IOP Publishing

ISSN: 1674-4926

Source: Journal of Semiconductors, Vol.36, Iss.7, 2015-07, pp. : 76001-76006

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract