Effect of FA/O complexing agents and H₂O₂ on chemical mechanical polishing of ruthenium in weakly alkaline slurry

Author： Bo Duan Weijing An Jianwei Zhou Shuai Wang

ISSN： 1674-4926

Source： Journal of Semiconductors, Vol.36, Iss.7, 2015-07, pp. : 76002-76006

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