Modeling the reactive sputter deposition of Ti-doped VO_x thin films

Author： Tao Wang He Yu De-En Gu Rui Guo Xiang Dong Ya-Dong Jiang Rui-Lin Wu

E-ISSN： 1741-4199|24|6|68104-68108

ISSN： 1674-1056

Source： Chinese Physics B, Vol.24, Iss.6, 2015-06, pp. : 68104-68108

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