Author: Hsieh C H Liang Y W Jeng J Y Chiou J S Leou K C Lin C
Publisher: IOP Publishing
E-ISSN: 1361-6595|24|3|35019-35027
ISSN: 0963-0252
Source: Plasma Sources Science and Technology, Vol.24, Iss.3, 2015-06, pp. : 35019-35027
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Abstract