Ionization of sputtered Ti, Al, and C coupled with plasma characterization in HiPIMS

Author： Lundin Daniel   Čada Martin   Hubička Zdeněk  

Publisher： IOP Publishing

E-ISSN： 1361-6595|24|3|35018-35028

ISSN： 0963-0252

Source： Plasma Sources Science and Technology, Vol.24, Iss.3, 2015-06, pp. : 35018-35028

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