Benzophenone doped polydimethylsiloxane: self developable composite resist system for its use in a direct write laser lithography application

Author： Bute Madhushree G   Shinde Shashikant D   Bodas Dhananjay   Fouad H   Adhi K P   Gosavi S W  

Publisher： IOP Publishing

E-ISSN： 1361-6463|48|17|175301-175309

ISSN： 0022-3727

Source： Journal of Physics D: Applied Physics, Vol.48, Iss.17, 2015-05, pp. : 175301-175309

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