Universal pattern transfer methods for metal nanostructures by block copolymer lithography

Author： TuKun-Hua   BaiWubin   LiontosGeorge   NtetsikasKonstantinos   AvgeropoulosApostolos   RossCaroline A  

Publisher： IOP Publishing

E-ISSN： 1361-6528|26|37|375301-375312

ISSN： 0957-4484

Source： Nanotechnology, Vol.26, Iss.37, 2015-09, pp. : 375301-375312

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Metal nanodot arrays fabricated via seed-mediated electroless plating with block copolymer thin film scaffolding

By Komiyama Hideaki   Iyoda Tomokazu   Sanji Takanobu  

Nanotechnology, Vol. 26, Iss. 39, 2015-10 ,pp. : 395302-395308

IOP Publishing

Access to resources Recommend Favorite

Structured nanoporous surfaces from hybrid block copolymer micelle films with metal ions

By  

Nanotechnology, Vol. 26, Iss. 9, 2015-03 ,pp. : 95302-95308

IOP Publishing

Access to resources Recommend Favorite

Print-to-pattern dry film photoresist lithography

By Garland Shaun P   Murphy Terrence M   Pan Tingrui  

Journal of Micromechanics and Microengineering, Vol. 24, Iss. 5, 2014-05 ,pp. : 57002-57009

IOP Publishing

Access to resources Recommend Favorite

Complex and useful polymer micro- and nanostructures via nanoimprint lithography

By Low Hong Yee  

International Journal of Nanotechnology, Vol. 4, Iss. 4, 2007-06 ,pp. : 389-403

Inderscience Publishers

Access to resources Recommend Favorite