Synthesis, Characterization, Thermal Property of Si(c‐C5H9NH)4 and Its Potential as CVD Precursor for SiC Film

Publisher： John Wiley & Sons Inc

E-ISSN： 1521-3749|641|10|1813-1817

ISSN： 0044-2313

Source： ZAAC-JOURNAL OF INORGANIC AND GENERAL CHEMISTRY (ELECTRONIC), Vol.641, Iss.10, 2015-08, pp. : 1813-1817

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