Deposition of Fluorine‐Containing Thin Film by Atmospheric Pressure Plasma Jet and Film Surface Structural Transition

Publisher: John Wiley & Sons Inc

E-ISSN: 1612-8869|12|4|362-371

ISSN: 1612-8850

Source: PLASMA PROCESSES AND POLYMERS (ELECTRONIC), Vol.12, Iss.4, 2015-04, pp. : 362-371

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Abstract