Effect of substrate temperature on the bonded states of indium tin oxide thin films deposited by plasma enhanced chemical vapor deposition

By Kim Y.-S.   Park Y.-C.   Ansari S.G.   Lee B.-S.   Shin H.-S.  

Thin Solid Films, Vol. 426, Iss. 1, 2003-02 ,pp. : 124-131

Elsevier

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Low‐Temperature Synthesis of Large‐Scale Molybdenum Disulfide Thin Films Directly on a Plastic Substrate Using Plasma‐Enhanced Chemical Vapor Deposition

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ADVANCED MATERIALS, Vol. 27, Iss. 35, 2015-09 ,pp. : 5223-5229

John Wiley & Sons Inc

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Effect of hydrogen dilution on the growth of nanocrystalline silicon films at high temperature by using plasma-enhanced chemical vapor deposition

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Thin Solid Films, Vol. 437, Iss. 1, 2003-08 ,pp. : 68-73

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Effect of the hydrogen flow rate on the structural and optical properties of hydrogenated amorphous silicon thin films prepared by plasma enhanced chemical vapor deposition

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Characterization of -Fe 2 O 3 thin films processed by plasma enhanced chemical vapor deposition (PECVD)

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