Effect of the postimplantation-annealing temperature on the properties of silicon light-emitting diodes fabricated through boron ion implantation into n-Si

Author: Sobolev N.   Emel’yanov A.   Shek E.   Vdovin V.  

Publisher: MAIK Nauka/Interperiodica

ISSN: 1063-7834

Source: Physics of the Solid State, Vol.46, Iss.1, 2004-01, pp. : 35-39

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