X-ray spectral analysis of the interface of a thin Al₂O₃ film prepared on silicon by atomic layer deposition

Author： Shulakov A. Braiko A. Bukin S. Drozd V.

ISSN： 1063-7834

Source： Physics of the Solid State, Vol.46, Iss.6, 2004-06, pp. : 1145-1148

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