Low-power RF plasma sources for technological applications: II. plasma sources under anomalous skin effect conditions

Author： Vavilin K.   Plaksin V.   Ri Kh.   Rukhadze A.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 1063-7842

Source： Technical Physics, Vol.49, Iss.6, 2004-06, pp. : 686-690

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