Low-Power RF plasma sources for technological applications: III. helicon plasma sources

Author: Vavilin K.   Rukhadze A.   Ri Kh.   Plaksin V.  

Publisher: MAIK Nauka/Interperiodica

ISSN: 1063-7842

Source: Technical Physics, Vol.49, Iss.6, 2004-06, pp. : 691-697

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