Features of the transport of sputtered atoms during Ta2O5 film deposition onto substrates of complicated configuration

Author： Bystrov Yu.   Laska V.   Vol’pyas V.   Govako E.   Timofeev D.   Troshkov V.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 1063-7850

Source： Technical Physics Letters, Vol.28, Iss.3, 2002-03, pp. : 173-175

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