TOF-SIMS 5 instrument sensitivity to matrix elements in GeSi Layers: Analysis based on recording of complex secondary ions

Author: Drozdov M.   Drozdov Yu.   Lobanov D.   Novikov A.   Yurasov D.  

Publisher: MAIK Nauka/Interperiodica

ISSN: 1027-4510

Source: Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques, Vol.5, Iss.3, 2011-06, pp. : 591-594

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