Influence of Rapid Thermal Annealing on the Structure and Electrical Properties of Ce-Doped HfO₂ Gate Dielectric

Author： Yong-Qiang Meng Zheng-Tang Liu Li-Ping Feng Shuai Chen

ISSN： 0256-307X

Source： Chinese Physics Letters, Vol.31, Iss.7, 2014-07, pp. : 77702-77704

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