HfO2-TiO2 Ultra-Thin Gate Dielectric by RF Sputtering

Author： Li G. X. Chen X. F. Ren W. Shi P. Wu X. Q. Tan O. K. Zhu W. G. Yao X.

ISSN： 0015-0193

Source： Ferroelectrics, Vol.410, Iss.1, 2011-01, pp. : 129-136

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