On the road to self-sputtering in high power impulse magnetron sputtering: particle balance and discharge characteristics

Author： Huo Chunqing   Lundin Daniel   Raadu Michael A   Anders André     Brenning Nils  

Publisher： IOP Publishing

ISSN： 0963-0252

Source： Plasma Sources Science and Technology, Vol.23, Iss.2, 2014-04, pp. : 25017-25027

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