Design consideration and fabrication of 1.2-kV 4H-SiC trenched-and-implanted vertical junction field-effect transistors

Author: Si-Zhe Chen   Kuang Sheng  

Publisher: IOP Publishing

ISSN: 1674-1056

Source: Chinese Physics B, Vol.23, Iss.7, 2014-07, pp. : 77201-77206

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