Plasmonic Antennas: Large‐Area Antenna‐Assisted SEIRA Substrates by Laser Interference Lithography (Advanced Optical Materials 11/2014)

Publisher： John Wiley & Sons Inc

E-ISSN： 2195-1071|2|11|1049-1049

ISSN： 2195-1071

Source： ADVANCED OPTICAL MATERIALS (ELECTRONIC), Vol.2, Iss.11, 2014-11, pp. : 1049-1049

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Large‐Area Antenna‐Assisted SEIRA Substrates by Laser Interference Lithography

By  

ADVANCED OPTICAL MATERIALS (ELECTRONIC), Vol. 2, Iss. 11, 2014-11 ,pp. : 1050-1056

John Wiley & Sons Inc

Access to resources Recommend Favorite

Contents: (Advanced Optical Materials 11/2014)

By  

ADVANCED OPTICAL MATERIALS (ELECTRONIC), Vol. 2, Iss. 11, 2014-11 ,pp. : 1011-1015

John Wiley & Sons Inc

Access to resources Recommend Favorite

Masthead: (Advanced Optical Materials 11/2014)

By  

ADVANCED OPTICAL MATERIALS (ELECTRONIC), Vol. 2, Iss. 11, 2014-11 ,pp. : n/a-n/a

John Wiley & Sons Inc

Access to resources Recommend Favorite

Large‐Area Low‐Cost Tunable Plasmonic Perfect Absorber in the Near Infrared by Colloidal Etching Lithography

By  

ADVANCED OPTICAL MATERIALS (ELECTRONIC), Vol. 3, Iss. 3, 2015-03 ,pp. : 398-403

John Wiley & Sons Inc

Access to resources Recommend Favorite

Repetitive Hole‐Mask Colloidal Lithography for the Fabrication of Large‐Area Low‐Cost Plasmonic Multishape Single‐Layer Metasurfaces

By  

ADVANCED OPTICAL MATERIALS (ELECTRONIC), Vol. 3, Iss. 5, 2015-05 ,pp. : 680-686

John Wiley & Sons Inc

Access to resources Recommend Favorite