Repetitive Hole‐Mask Colloidal Lithography for the Fabrication of Large‐Area Low‐Cost Plasmonic Multishape Single‐Layer Metasurfaces

Publisher： John Wiley & Sons Inc

E-ISSN： 2195-1071|3|5|680-686

ISSN： 2195-1071

Source： ADVANCED OPTICAL MATERIALS (ELECTRONIC), Vol.3, Iss.5, 2015-05, pp. : 680-686

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