Etching of low-k materials in high density fluorocarbon plasma*

Author： Eon D. Raballand V. Cartry G. Peignon-Fernandez M.-C. Cardinaud Ch.

E-ISSN： 1286-0050|28|3|331-337

ISSN： 1286-0042

Source： EPJ Applied Physics (The), Vol.28, Iss.3, 2004-11, pp. : 331-337

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