Rapid crystallization of amorphous silicon utilizing a VHF plasma annealing at atmospheric pressure

Author： Shirai H.   Sakurai Y.   Yeo M.   Kobayashi T.   Ishikawa T.  

Publisher： Edp Sciences

E-ISSN： 1286-0050|37|3|315-322

ISSN： 1286-0042

Source： EPJ Applied Physics (The), Vol.37, Iss.3, 2007-01, pp. : 315-322

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Power change in amorphous silicon technology by low temperature annealing

By Mittal Ankit   Rennhofer Marcus   Dangel Angelika   Duman Bogdan   Schlosser Victor  

EPJ Photovoltaics, Vol. 6, Iss. issue, 2015-07 ,pp. : 65304-65304

Edp Sciences

Access to resources Recommend Favorite

Atmospheric pressure plasma jet for decontamination purposes *

By Pawłat Joanna  

EPJ Applied Physics (The), Vol. 61, Iss. 2, 2013-02 ,pp. : 24323-24323

Edp Sciences

Access to resources Recommend Favorite

Fluid modeling of a microwave micro-plasma at atmospheric pressure

By Gregório J.   Boisse-Laporte C.   Alves L. L.  

EPJ Applied Physics (The), Vol. 49, Iss. 1, 2010-01 ,pp. : 13102-13102

Edp Sciences

Access to resources Recommend Favorite

Fluid modeling of a microwave micro-plasma at atmospheric pressure

By Gregório J.   Boisse-Laporte C.   Alves L. L.  

EPJ Applied Physics (The), Vol. 50, Iss. 2, 2010-05 ,pp. : 21601-21601

Edp Sciences

Access to resources Recommend Favorite

The residual electrically active damage in low energy boron implanted silicon: rapid thermal annealing and implant mass effects*

By Kaabi L.   Ben Brahim J.   Remaki B.   Gontrand C.   El Omari H.   Bureau J.-C.   Sassi Z.   Balland B.  

EPJ Applied Physics (The), Vol. 3, Iss. 1, 2010-03 ,pp. : 49-52

Edp Sciences

Access to resources Recommend Favorite