EUV lithography: technology for the semiconductor industry in 2010

E-ISSN： 1432-1092|35|5|149-152

ISSN： 0531-7479

Source： EPN Europhysics news, Vol.35, Iss.5, 2010-03, pp. : 149-152

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

EUV source design flexibility for lithography

Journal of Physics: Conference Series , Vol. 112, Iss. 4, 2008-05 ,pp. : 255-258

IOP Publishing

Access to resources Recommend Favorite

Electron-beam lithography simulation for EUV mask applications

Journal of Physics: Conference Series , Vol. 10, Iss. 1, 2005-01 ,pp. : 385-388

IOP Publishing

Access to resources Recommend Favorite

Modeling of mask diffraction and projection imaging for advanced optical and EUV lithography

By Erdmann Andreas Shao Feng Agudelo Viviana Fuhner Tim Evanschitzky Peter

Journal of Modern Optics, Vol. 58, Iss. 5-6, 2011-03 ,pp. : 480-495

Taylor & Francis Ltd

Access to resources Recommend Favorite

On the possibility of applying kinoform elements in mirror projectors for EUV lithography

By Venediktov V.

Technical Physics, Vol. 52, Iss. 1, 2007-01 ,pp. : 126-128

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

Applications of short wavelength radiation : Soft X-ray microscopy and EUV lithography

Le Journal de Physique IV, Vol. 11, Iss. PR2, 2001-07 ,pp. : Pr2-443-Pr2-449

Edp Sciences

Access to resources Recommend Favorite