Modeling of mask diffraction and projection imaging for advanced optical and EUV lithography

Author： Erdmann Andreas   Shao Feng   Agudelo Viviana   Fuhner Tim   Evanschitzky Peter  

Publisher： Taylor & Francis Ltd

ISSN： 1362-3044

Source： Journal of Modern Optics, Vol.58, Iss.5-6, 2011-03, pp. : 480-495

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

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