Titanium carbide film deposition on silicon wafers by pulsed KrF laser ablationof titanium in low-pressure CH4 and C2H2 atmospheres

Author: D'Anna E.   Fernández M.   Leggieri G.   Luches A.   Zocco A.   Majni G.  

Publisher: Edp Sciences

E-ISSN: 1286-0050|28|2|159-163

ISSN: 1286-0042

Source: EPJ Applied Physics (The), Vol.28, Iss.2, 2004-08, pp. : 159-163

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Abstract