An advanced tunnel oxide layer process for 65 nm NOR floating-gate flash memories

Author： Chiu Shengfen   Xu Yue   Ji Xiaoli   Liao Yiming   Wu Fuwei   Yan Feng  

Publisher： IOP Publishing

E-ISSN： 1361-6641|30|10|105032-105037

ISSN： 0268-1242

Source： Semiconductor Science and Technology, Vol.30, Iss.10, 2015-10, pp. : 105032-105037

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

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