Phase retrieval from the spectral interference signal used to measure thickness of SiO2 thin film on silicon wafer

Author： Hlubina P.   Ciprian D.   Luňáček J.   Chlebus R.  

Publisher： Springer Publishing Company

ISSN： 0946-2171

Source： Applied Physics B, Vol.88, Iss.3, 2007-08, pp. : 397-403

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