Proton beam writing: a tool for high-aspect ratio mask production

Author: Kan J.   Shao P.   Ansari K.   Bettiol A.   Osipowicz T.   Watt F.  

Publisher: Springer Publishing Company

ISSN: 0946-7076

Source: Microsystem Technologies, Vol.13, Iss.5-6, 2007-03, pp. : 431-434

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